-
1
-
-
8644251433
-
Reliability, yield, and performance of a 90 nm SOI/Cu/SiCOH technology
-
Burlingame, CA, United States, June 7-9
-
Edelstein D, Davis C, Clevenger L, Yoon M, Cowley A, Nogami T, Rathore H, Agarwala B, Arai S, Carbone A, Chanda K, Cohen S, Cote W, Cullinan M, Dalton T, Das S, Davis P, Demarest J, Dunn D, Dziobkowski C, Filippi R, Fitzsimmons J, Flaitz P, Gates S, Gill J, Grill A, Hawken D, Ida K, Klaus D, Klymko N, Lane M, Lane S, Lee J, Landers W, Li WK, Lin YH, Liniger E, Liu XH, Madan A, Malhotra S, Martin J, Molis S, Muzzy C, Nguyen D, Nguyen S, Ono M, Parks D, Questad D, Restaino D, Sakamoto A, Shaw T, Shimooka Y, Simon A, Simonyi E, Tempest S, van Kleeck T, Vogt S, Wang YY, Wille W, Wright J, Yang CC, Ivers T (2004) Reliability, yield, and performance of a 90 nm SOI/Cu/SiCOH technology. In: Proceedings of the 7th IEEE international interconnect technology conference, Burlingame, CA, United States, June 7-9, p 214
-
(2004)
Proceedings of the 7th IEEE International Interconnect Technology Conference
, pp. 214
-
-
Edelstein, D.1
Davis, C.2
Clevenger, L.3
Yoon, M.4
Cowley, A.5
Nogami, T.6
Rathore, H.7
Agarwala, B.8
Arai, S.9
Carbone, A.10
Chanda, K.11
Cohen, S.12
Cote, W.13
Cullinan, M.14
Dalton, T.15
Das, S.16
Davis, P.17
Demarest, J.18
Dunn, D.19
Dziobkowski, C.20
Filippi, R.21
Fitzsimmons, J.22
Flaitz, P.23
Gates, S.24
Gill, J.25
Grill, A.26
Hawken, D.27
Ida, K.28
Klaus, D.29
Klymko, N.30
Lane, M.31
Lane, S.32
Lee, J.33
Landers, W.34
Li, W.K.35
Lin, Y.H.36
Liniger, E.37
Liu, X.H.38
Madan, A.39
Malhotra, S.40
Martin, J.41
Molis, S.42
Muzzy, C.43
Nguyen, D.44
Nguyen, S.45
Ono, M.46
Parks, D.47
Questad, D.48
Restaino, D.49
Sakamoto, A.50
Shaw, T.51
Shimooka, Y.52
Simon, A.53
Simonyi, E.54
Tempest, S.55
Van Kleeck, T.56
Vogt, S.57
Wang, Y.Y.58
Wille, W.59
Wright, J.60
Yang, C.C.61
Ivers, T.62
more..
-
2
-
-
8644272510
-
Optimization of SiCOH dielectrics for integration in a 90 nm CMOS technology
-
Burlingame, CA, United States, June 7-9
-
Grill A, Edelstein D, Restaino D, Lane M, Gates S, Liniger E, Shaw T, Liu XH, Klaus D, Patel V, Cohen S, Simonyi E, Klymko N, Lane S, Ida K, Vogt S, van Kleeck T, Davis C, Ono M, Nogami T, Ivers T (2004) Optimization of SiCOH dielectrics for integration in a 90 nm CMOS technology. In: Proceedings of the 7th IEEE international interconnect technology conference, Burlingame, CA, United States, June 7-9, p 54
-
(2004)
Proceedings of the 7th IEEE International Interconnect Technology Conference
, pp. 54
-
-
Grill, A.1
Edelstein, D.2
Restaino, D.3
Lane, M.4
Gates, S.5
Liniger, E.6
Shaw, T.7
Liu, X.H.8
Klaus, D.9
Patel, V.10
Cohen, S.11
Simonyi, E.12
Klymko, N.13
Lane, S.14
Ida, K.15
Vogt, S.16
Van Kleeck, T.17
Davis, C.18
Ono, M.19
Nogami, T.20
Ivers, T.21
more..
-
3
-
-
84950317098
-
Spin-on dielectric materials
-
Wiley NY
-
Dubois G, Volksen W, Miller RD (2007) Spin-on dielectric materials. In: Baklanov M, Maex K, Green M (eds) Dielectric films for advanced microelectronics. Wiley, NY, p 33
-
(2007)
Dielectric Films for Advanced Microelectronics
, pp. 33
-
-
Dubois, G.1
Volksen, W.2
Miller, R.D.3
Baklanov, M.4
Maex, K.5
Green, M.6
-
5
-
-
0000058188
-
Low-k dielectrics characterization for damascene integration
-
Burlingame, CA, USA
-
Lin S, Jin C, Lui L, Tsai M, Daniels M, Gonzalez A, Wetzel JT, Monnig KA, Winebarger PA, Jang S, Yu D, Liang MS (2001) Low-k dielectrics characterization for damascene integration. In: Proceedings of the IEEE international interconnect technology conference, Burlingame, CA, USA, p 146
-
(2001)
Proceedings of the IEEE International Interconnect Technology Conference
, pp. 146
-
-
Lin, S.1
Jin, C.2
Lui, L.3
Tsai, M.4
Daniels, M.5
Gonzalez, A.6
Wetzel, J.T.7
Monnig, K.A.8
Winebarger, P.A.9
Jang, S.10
Yu, D.11
Liang, M.S.12
-
6
-
-
84888426890
-
Material property characterization and integration issues for mesoporous silica
-
San Francisco, May 24-26
-
Ryan ET, Ho H-M, Wu W-L, Ho PS, Gidley DW, Drage J (1999) Material property characterization and integration issues for mesoporous silica. In: Proceedings of the IEEE international interconnect technology conference, San Francisco, May 24-26, p 187
-
(1999)
Proceedings of the IEEE International Interconnect Technology Conference
, pp. 187
-
-
Ryan, E.T.1
Ho, H.-M.2
Wu, W.-L.3
Ho, P.S.4
Gidley, D.W.5
Drage, J.6
-
8
-
-
28244450273
-
Effect of porosity on reducing cohesive strength and accelerating crack growth in ultra low-k thin-films
-
Burlingame, CA, USA, June 3-5
-
Guyer EP, Dauskardt RH (2005) Effect of porosity on reducing cohesive strength and accelerating crack growth in ultra low-k thin-films. In: Proceedings of the 5th IEEE international interconnect technology conference, Burlingame, CA, USA, June 3-5, p 223
-
(2005)
Proceedings of the 5th IEEE International Interconnect Technology Conference
, pp. 223
-
-
Guyer, E.P.1
Dauskardt, R.H.2
-
10
-
-
84961689594
-
Porosity effects on low-k dielectric film strength and interfacial adhesion
-
Burlingame, CA, USA, June 3-5
-
Kloster G, Scherban T, Xu G, Blaine J, Sun B, Zhou Y (2002) Porosity effects on low-k dielectric film strength and interfacial adhesion. In: Proceedings of the 5th IEEE international interconnect technology conference, Burlingame, CA, USA, June 3-5, p 242
-
(2002)
Proceedings of the 5th IEEE International Interconnect Technology Conference
, pp. 242
-
-
Kloster, G.1
Scherban, T.2
Xu, G.3
Blaine, J.4
Sun, B.5
Zhou, Y.6
-
11
-
-
0037175794
-
-
Liu J, Gan D, Hu C, Kiene M, Ho PS, Volksen W, Miller RD (2002) Appl Phys Lett 81:4180
-
(2002)
Appl Phys Lett
, vol.81
, pp. 4180
-
-
Liu, J.1
Gan, D.2
Hu, C.3
Kiene, M.4
Ho, P.S.5
Volksen, W.6
Miller, R.D.7
-
13
-
-
33646305152
-
-
Bennett AE, Rienstra CM, Auger M, Lakshmi KV, Griffin RG (1995) J Chem Phys 103:6951
-
(1995)
J Chem Phys
, vol.103
, pp. 6951
-
-
Bennett, A.E.1
Rienstra, C.M.2
Auger, M.3
Lakshmi, K.V.4
Griffin, R.G.5
-
15
-
-
0037008575
-
-
Hedrick JL, Magbitang T, Connor EF, Glauser T, Volksen W, Hawker CJ, Lee VY, Miller RD (2002) Chem Eur J 8:3308
-
(2002)
Chem Eur J
, vol.8
, pp. 3308
-
-
Hedrick, J.L.1
Magbitang, T.2
Connor, E.F.3
Glauser, T.4
Volksen, W.5
Hawker, C.J.6
Lee, V.Y.7
Miller, R.D.8
-
18
-
-
84939775172
-
-
Sing KSW, Everett DH, Haul RAW, Moscou L, Pierotti RA, Rouquerol J, Siemieniewska T (1985) Pure Appl Chem 57:603
-
(1985)
Pure Appl Chem
, vol.57
, pp. 603
-
-
Sing, K.S.W.1
Everett, D.H.2
Haul, R.A.W.3
Moscou, L.4
Pierotti, R.A.5
Rouquerol, J.6
Siemieniewska, T.7
-
19
-
-
0034658167
-
-
Asefa T, MacLachlan MJ, Grondey H, Coombs N, Ozin GA (2000) Angew Chem Int Ed 39:1808
-
(2000)
Angew Chem Int Ed
, vol.39
, pp. 1808
-
-
Asefa, T.1
MacLachlan, M.J.2
Grondey, H.3
Coombs, N.4
Ozin, G.A.5
-
22
-
-
23844554520
-
-
San Diego, CA, USA, October 19-21, and Tokyo, Japan, September 28-29, 2004
-
Abell T, Iacopi F, Prokopowicz G, Sun B, Mazurenko A, Travaly Y, Baklanov M, Jonas A, Sullivan C, Brongersma S, Liou H-C, Tower J, Gostein M, Gallagher M, Calvert J, Moinpour M, Maex K (2005) In: Proceedings of the advanced metal conference 2004, San Diego, CA, USA, October 19-21, and Tokyo, Japan, September 28-29, 2004, p 457
-
(2005)
Proceedings of the Advanced Metal Conference 2004
, pp. 457
-
-
Abell, T.1
Iacopi, F.2
Prokopowicz, G.3
Sun, B.4
Mazurenko, A.5
Travaly, Y.6
Baklanov, M.7
Jonas, A.8
Sullivan, C.9
Brongersma, S.10
Liou, H.-C.11
Tower, J.12
Gostein, M.13
Gallagher, M.14
Calvert, J.15
Moinpour, M.16
Maex, K.17
-
23
-
-
36549062079
-
-
Dubois G, Volksen W, Magbitang T, Miller RD, Gage DM, Dauskardt RH (2007) Adv Mater 19:3989
-
(2007)
Adv Mater
, vol.19
, pp. 3989
-
-
Dubois, G.1
Volksen, W.2
Magbitang, T.3
Miller, R.D.4
Gage, D.M.5
Dauskardt, R.H.6
-
24
-
-
0035507784
-
-
Jain A, Rogojevic S, Ponoth S, Agarwal N, Matthew I, Gill WN, Persans P, Tomozawa M, Plawsky JL, Simonyi E (2001) Thin Solid Films 398-399:513
-
(2001)
Thin Solid Films
, vol.398-399
, pp. 513
-
-
Jain, A.1
Rogojevic, S.2
Ponoth, S.3
Agarwal, N.4
Matthew, I.5
Gill, W.N.6
Persans, P.7
Tomozawa, M.8
Plawsky, J.L.9
Simonyi, E.10
-
25
-
-
33747133676
-
-
Tajima N, Ohno T, Hamada T, Yoneda K, Kobayashi N, Hasaka S, Inoue M (2006) Appl Phys Lett 89:061907/1
-
(2006)
Appl Phys Lett
, vol.89
-
-
Tajima, N.1
Ohno, T.2
Hamada, T.3
Yoneda, K.4
Kobayashi, N.5
Hasaka, S.6
Inoue, M.7
-
26
-
-
34250648953
-
-
Ro HW, Char K, Jeon E-c, Kim H-J, Kwon D, Lee H-J, Lee J-K, Rhee H-W, Soles CL, Yoon DY (2007) Adv Mater 19:705
-
(2007)
Adv Mater
, vol.19
, pp. 705
-
-
Ro, H.W.1
Char, K.2
Jeon, E.-C.3
Kim, H.-J.4
Kwon, D.5
Lee, H.-J.6
Lee, J.-K.7
Rhee, H.-W.8
Soles, C.L.9
Yoon, D.Y.10
-
27
-
-
8644259299
-
-
Burlingame, CA, USA
-
Char K, Cha BJ, Kim S (2004) In: Proceedings of the 7th IEEE international interconnect technology conference, Burlingame, CA, USA, p 219
-
(2004)
Proceedings of the 7th IEEE International Interconnect Technology Conference
, pp. 219
-
-
Char, K.1
Cha, B.J.2
Kim, S.3
-
29
-
-
18744409540
-
-
Hatton BD, Landskron K, Whitnall W, Perovic DD, Ozin GA (2005) Adv Funct Mater 15:823
-
(2005)
Adv Funct Mater
, vol.15
, pp. 823
-
-
Hatton, B.D.1
Landskron, K.2
Whitnall, W.3
Perovic, D.D.4
Ozin, G.A.5
-
31
-
-
0034616781
-
-
Lu Y, Fan H, Doke N, Loy DA, Assink RA, LaVan DA, Brinker CJ (2000) J Am Chem Soc 122:5258
-
(2000)
J Am Chem Soc
, vol.122
, pp. 5258
-
-
Lu, Y.1
Fan, H.2
Doke, N.3
Loy, D.A.4
Assink, R.A.5
Lavan, D.A.6
Brinker, C.J.7
-
33
-
-
0033548611
-
-
Grandbois M, Beyer M, Rief M, Clausen-Schaumann H, Gaub HE (1999) Science 283:1727
-
(1999)
Science
, vol.283
, pp. 1727
-
-
Grandbois, M.1
Beyer, M.2
Rief, M.3
Clausen-Schaumann, H.4
Gaub, H.E.5
-
34
-
-
51949100795
-
Molecular aspects
-
Applied Science Publishers, London and New York
-
Kinloch AJ, Young RJ (1983) Molecular aspects. In: Fracture behaviour of polymers. Applied Science Publishers, London and New York, p 43
-
(1983)
Fracture Behaviour of Polymers
, pp. 43
-
-
Kinloch, A.J.1
Young, R.J.2
|