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Volumn 23, Issue 5, 2005, Pages 1913-1923
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Towards a controlled patterning of 10 nm silicon gates in high density plasmas
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Author keywords
[No Author keywords available]
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Indexed keywords
CRITICAL DIMENSION (CD) CONTROL;
SILICON GATES;
MASKS;
PLASMA APPLICATIONS;
SEMICONDUCTING SILICON;
GATES (TRANSISTOR);
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EID: 31144441052
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2008272 Document Type: Article |
Times cited : (25)
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References (21)
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