Analyses of chamber wall coatings during the patterning of ultralow- k materials with a metal hard mask: Consequences on cleaning strategies

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 3, 2007, Pages 886-892

  Chevolleau, T ^a   Darnon, M ^a   David, T ^b   Posseme, N ^b   Torres, J ^c   Joubert, O ^a  

^a CEA LETI   (France)

^b MINATEC   (France)

^c STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; ETCHING; FLUOROCARBONS; PLASMA APPLICATIONS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHAMBER WALLS; METAL HARD MASKS; PROCESS DRIFTS; SELECTIVITY;

COATINGS;

EID: 34249875953     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2738482     Document Type: Article

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