SCOPUS 정보 검색 플랫폼

Volumn 81, Issue 8, 2002, Pages 1447-1449

Depth-profiling plasma-induced densification of porous low-k thin films using positronium annihilation lifetime spectroscopy

(5) Sun, Jia Ning a Gidley, David W a Hu, Yifan a Frieze, William E a Ryan, E Todd b

a UNIVERSITY OF MICHIGAN (United States)

b MOTOROLA INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSE LAYER; DEPTH PROFILE; DEVICE INTEGRATION; LIFETIME SPECTROSCOPY; LOW DIELECTRIC CONSTANTS; OXYGEN ASHING; PLASMA EXPOSURE TIME; PLASMA-INDUCED; POROUS LOW-K; STRUCTURAL DAMAGES; SURFACE LAYERS;

PLASMAS; POSITRON ANNIHILATION; THIN FILMS;

DEPTH PROFILING;

EID: 79955994680 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1501767 Document Type: Article

Times cited : (49)

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