Aqueous developable dual switching photoresists for nanolithography

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 50, Issue 20, 2012, Pages 4255-4265

  Chen, Lan ^a   Goh, Yong Keng ^a   Cheng, Han Hao ^a   Smith, Bruce W ^b   Xie, Peng ^b   Montgomery, Warren ^a,c,d   Whittaker, Andrew K ^a,d   Blakey, Idriss ^a,d  

^a UNIVERSITY OF QUEENSLAND   (Australia)

^b Rochester Institute of Technology   (United States)

^c SEMATECH   (United States)

^d SUNY POLYTECHNIC INSTITUTE   (United States)

Author keywords

copolymerization; imaging; photochemistry; photoreactive effects; photoresists; structure property relations

Indexed keywords

ACID DIFFUSION; AQUEOUS DEVELOPABLE; ATTENUATED TOTAL REFLECTANCE FOURIER TRANSFORM INFRARED SPECTROSCOPY; CHAIN SCISSION; FUNCTIONALIZED; GRAZING ANGLES; INTERFERENCE LITHOGRAPHY; NANOSCALE PATTERNING; PATTERN FIDELITY; PENDANT GROUPS; PHOTO-INDUCED; PHOTOACID GENERATORS; PHOTOREACTIVE EFFECT; POLARITY SWITCHES; POLYMER THIN FILMS; STRUCTURE PROPERTY RELATION; SWITCHING MECHANISM; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

CARBOXYLIC ACIDS; CHEMICAL REACTIONS; COPOLYMERIZATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IMAGING TECHNIQUES; LITHOGRAPHY; MOLECULAR WEIGHT; OLEFINS; PHOTOCHEMICAL REACTIONS; PHOTORESISTS; SOLUBILITY; SPECTROSCOPIC ELLIPSOMETRY; SWITCHING;

POLYMERS;

EID: 84866074823     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.26232     Document Type: Article

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