Chemical amplification resists: Inception, implementation in device manufacture, and new developments

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 41, Issue 24, 2003, Pages 3863-3870

  Ito, Hiroshi ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Chemical amplification; Deprotection; Lithography; Photochemical acid generators; Resists

Indexed keywords

ACIDS; IRRADIATION; LITHOGRAPHY; MICROELECTRONICS; RANDOM ACCESS STORAGE;

ACID CATALYZED DEPROTECTION; CHEMICAL AMPLIFICATION RESISTS; CHEMICAL TRANSFORMATIONS; DEEP ULTRAVIOLET LITHOGRAPHY; DYNAMIC RANDOM ACCESS MEMORY; PHOTOCHEMICAL ACID GENERATORS;

PHOTORESISTS;

POLYMER SCIENCE; PRODUCT DEVELOPMENT;

EID: 0348252166     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.10963     Document Type: Article

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