Underlayer designs to enhance the performance of EUV resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Xu, Hao ^a   Blackwell, James M ^b   Younkin, Todd R ^b   Min, Ke ^b  

^a BREWER SCIENCE INC   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

EUV; Lithography; LWR; PAG; Photoacid generator; Photospeed; Resolution; RLS tradeoff; Underlayer

Indexed keywords

EUV; LWR; PAG; PHOTOACID GENERATOR; PHOTOSPEED; RESOLUTION; RLS TRADEOFF; UNDERLAYER;

COMMUNICATION CHANNELS (INFORMATION THEORY); PHENOLS; PHOTORESISTORS;

ULTRAVIOLET DEVICES;

EID: 65849111019     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814223     Document Type: Conference Paper

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