Normalized image log slope with secondary electron migration effect in chemically amplified extreme ultraviolet resists

Applied Physics Express

Volumn 2, Issue 9, 2009, Pages

  Kozawa, Takahiro ^a   Tagawa, Seiichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AERIAL IMAGES; CHEMICAL GRADIENTS; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; IMAGE FORMATIONS; LATENT IMAGES; LINE EDGE ROUGHNESS; NORMALIZED IMAGE LOG SLOPES; SECONDARY ELECTRONS;

PHOTORESISTS; SECONDARY EMISSION;

ULTRAVIOLET DEVICES;

EID: 70349102427     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.2.095004     Document Type: Article

References (25)

1. C. A. Mack: Field Guide to Optical Lithography (SPIE, Berlingham, WA, 2006) p. 53.
2. H. Ito: Microlithography/Molecular Imprinting (Springer, Heidelberg, 2005) Advances in Polymer Science, Vol.172, p. 37.
3. W. Hinsberg et al.: J. Vac. Sci. Technol. B 16 (1998) 3689.
4. S. C. Palmateer et al.: Proc. SPIE 3333 (1998) 634.
5. T. B. Michaelson et al.: Proc. SPIE 5753 (2005) 368.
6. J. Shin et al.: J. Vac. Sci. Technol. B 19 (2001) 2890.
7. S. Wurm: Jpn. J. Appl. Phys. 46 (2007) 6105.
8. T. Kozawa et al.: Jpn. J. Appl. Phys. 31 (1992) 4301.
9. T. Kozawa et al.: J. Vac. Sci. Technol. B 24 (2006) L27.
10. T. Kozawa et al.: J. Appl. Phys. 103 (2008) 084306.
11. T. Kozawa et al.: J. Vac. Sci. Technol. B 25 (2007) 2481.
12. T. Kozawa et al.: Appl. Phys. Express 1 (2008) 027001.
13. H. Yamamoto et al.: Jpn. J. Appl. Phys. 44 (2005) 5836.
14. T. Kozawa et al.: J. Vac. Sci. Technol. B 22 (2004) 3489.
15. S. Tanuma et al.: Surf. Interface Anal. 21 (1994) 165.
16. R. Hirose et al.: Jpn. J. Appl. Phys. 47 (2008) 7125.
17. R. Hirose et al.: Jpn. J. Appl. Phys. 46 (2007) L979.
18. H. Yamamoto et al.: Jpn. J. Appl. Phys. 43 (2004) L848.
19. T. Kozawa et al.: J. Vac. Sci. Technol. B 24 (2006) 3055.
20. T. Kozawa et al.: Jpn. J. Appl. Phys. 46 (2007) L1143.
21. T. Kozawa and S. Tagawa: Jpn. J. Appl. Phys. 47 (2008) 7822.
22. T. Kozawa et al.: Jpn. J. Appl. Phys. 47 (2008) 4926.
23. T. Kozawa and S. Tagawa: Appl. Phys. Express 1 (2008) 107001.
24. T. Kozawa and S. Tagawa: Appl. Phys. Express 2 (2009) 056503.
25. G. M. Gallatin: Proc. SPIE 5754 (2005) 38.