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Volumn 125, Issue 11 SPEC. ISS., 2004, Pages 1791-1799

Dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

(12) Ishikawa, Takuji a Kodani, Tesuhiro a Yoshida, Tomohiro a Moriya, Tsukasa a Yamashita, Tsuneo a Toriumi, Minoru a Araki, Takayuki a Aoyama, Hirokazu a Hagiwara, Takuya b Furukawa, Takamitsu b Itani, Toshiro b Fujii, Kiyoshi b

a Japan (Japan)

b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

157 nm lithography; Exo; Fluoropolymer; Hexafluoroisopropanol; Norbornene; Polymer reaction; Quartz crystal microbalance; Resist; Tetrafluoroethylene

Indexed keywords

ALCOHOL; ALKYL GROUP; ETHYLENE; HYDROXIDE; NORBORNENE DERIVATIVE; POLYMER; RESIN;

CONFERENCE PAPER; DISSOLUTION; FLUORINATION; POLYMERIZATION; SOLUBILITY; SYNTHESIS;

EID: 9944261018 PISSN: 00221139 EISSN: None Source Type: Journal
DOI: 10.1016/j.jfluchem.2004.09.012 Document Type: Conference Paper

Times cited : (5)

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