Development of interference lithography for 22 nm node and below

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 1944-1947

  Fukushima, Yasuyuki ^a   Yamaguchi, Yuya ^a   Iguchi, Takafumi ^a   Urayama, Takuro ^a   Harada, Tetsuo ^a   Watanabe, Takeo ^a   Kinoshita, Hiroo ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Extreme ultraviolet; Interference; Resist; Transmission grating; Undulator

Indexed keywords

BEAM LINES; CHEMICALLY AMPLIFIED RESIST; EUV RESISTS; EXPOSURE TOOL; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; INTERFERENCE LITHOGRAPHY; RESIST; TRANSMISSION GRATING; TRANSMISSION GRATINGS;

ELECTRON BEAMS; EXPOSURE METERS; PHOTORESISTS; PLASMA ETCHING; WET ETCHING; WIGGLERS;

NANOTECHNOLOGY;

EID: 79960047338     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.02.076     Document Type: Conference Paper

References (14)

1. H. Kinoshita, K. Kurihara, Y. Ishii, and Y. Torii J. Vac. Sci. Technol. B 7 1987 1648
2. ITRS Roadmap [< http://www.itrs.net/ >].
3. H.H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrinaa, B.H. Sohn, X.M. Yang, and P. Nealey Appl. Phys. Lett. 75 1999 2328
4. H.H. Solak, C. David, J. Gobrecht, V. Golovkina, F. Cerrina, S.O. Kim, and P.F. Nealey Microelectron. Eng. 67 2003 56
5. P.P. Naulleau, C.N. Anderson, and S.F. Horne Proc. SPIE 6517 2007 65172T
6. H.H. Solak, D. He, W. Li, and F. Cerrina J. Vac. Sci. Technol. B 17 1999 3052
7. S. Suzuki, Y. Fukushima, R. Ohnishi, T. Watanabe, and H. Kinoshita J. Photopolym. Sci. Technol. 21 2008 435
8. H. Shiotani, S. Suzuki, D. Gun Lee, P. Naulleau, Y. Fukushima, R. Ohnishi, T. Watanabe, and H. Kinoshita Jpn. J. Appl. Phys. 47 2008 4881
9. H. Ito J. Polym. Sci. Part A, Polym. Chem. 41 2003 3863
10. H. Ito Proc. SPIE 1999 3678
11. S. Hashimoto, A. Ando, M. Nibe, S. Miyamoto, Y. Shoji, Y. Fukuda, T. Tanaka, and Y. Gomei Nucl. Instrum. Methods Phys. Res. Sect. A 467 2001 141
12. Y. Nagata, K. Furusawa, Y. Nabekawa, and K. Midorikawa Opt. Lett. 32 2007 722
13. Yasuyuki Fukushima, Naoki Sakagami, Teruhiko Kimura, Yoshito Kamaji, Takafumi Iguchi, Yuya Yamaguchi, Masaki Tada, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita Jpn. J. Appl. Phys. 49 2010 06GD06
14. Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita J. Photopolym. Sci. Technol. 23 2010 673