Local critical dimension variation from shot-noise related line edge roughness

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 3033-3036

  Kruit, P ^a   Steenbrink, S ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b MAPPER Lithography BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; DOSIMETRY; ELECTRONS; LITHOGRAPHY; PHOTONS; SHOT NOISE; SURFACE ROUGHNESS;

ACID GENERATION; DOSE VARIATIONS; RESISTS; SHOT NOISE EFFECTS;

DIMENSIONAL STABILITY;

EID: 29044434488     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2127941     Document Type: Article

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