The rational design of polymeric, EUV resist materials by QSPR modelling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Jack, Kevin ^a   Liu, Heping ^a   Blakey, Idriss ^a   Hill, David ^a   Yueh, Wang ^b   Cao, Heidi ^b   Leeson, Michael ^b   Denbeaux, Greg ^c   Waterman, Justin ^c   Whittaker, Andrew ^a  

^a UNIVERSITY OF QUEENSLAND   (Australia)

^b INTEL CORPORATION   (United States)

^c STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

EUV; Lithography; Non CAR; Polymer; Polymer degradation; Resist

Indexed keywords

CORRELATION METHODS; IONIZATION; LITHOGRAPHY; MASS SPECTROMETERS; MOLECULAR WEIGHT; QUALITY CONTROL;

FRAGMENTATION DATA; HIGH-SENSITIVITY; POLYMER DEGRADATION; PRELIMINARY MODEL;

POLYMERS;

EID: 35148822343     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.716213     Document Type: Conference Paper

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