Fabrication of <5 nm width lines in poly(methylmethacrylate) resist using a water:isopropyl alcohol developer and ultrasonically-assisted development

Applied Physics Letters

Volumn 78, Issue 18, 2001, Pages 2760-2762

  Yasin, Shazia ^a   Hasko, D G ^a   Ahmed, H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035971781     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1369615     Document Type: Article

References (15)

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