Application of quantitative structure property relationship to the design of high refractive index 193i resist

Journal of Micro/ Nanolithography, MEMS, and MOEMS

Volumn 7, Issue 2, 2008, Pages

  Liu, Heping ^a   Blakey, Idriss ^a   Conley, Willard E ^b   George, Graeme A ^c   Hill, David J T ^a   Whittaker, Andrew K ^a  

^a UNIVERSITY OF QUEENSLAND   (Australia)

^b FREESCALE SEMICONDUCTOR INC   (United States)

^c QUEENSLAND UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

193 nm immersion lithography; Quantitative structure property relationship (QSPR); Rational design; Refractive index polymer; Sulfur

Indexed keywords

COPOLYMERS; DESIGN; STRUCTURAL DESIGN; SULFUR;

193-NM IMMERSION; ADAMANTYL METHACRYLATE; METHACRYLATE DERIVATIVES; QUANTITATIVE STRUCTURE PROPERTY RELATIONSHIPS; QUANTITATIVE STRUCTURE-PROPERTY RELATIONSHIP MODELS; RATIONAL DESIGN; REFRACTIVE INDEX DISPERSION; STRUCTURAL DESCRIPTORS;

REFRACTIVE INDEX;

EID: 84921472819     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2908937     Document Type: Article

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