Chain-scission polyesters for EUV lithography

Journal of Photopolymer Science and Technology

Volumn 23, Issue 5, 2010, Pages 665-671

  Cardineau, Brian ^a   Kruger, Seth ^a   Earley, William ^a   Higgins, Craig ^a   Revuru, Srividya ^a   Georger, Jacque ^b   Brainard, Robert ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b SEMATECH   (United States)

Author keywords

Acid Catalyzed; Acid Cleavabie; Chain Scission; EUV; Lithography; Photoresists; Polyester

Indexed keywords

EID: 77957153195     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.23.665     Document Type: Article

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