Polymer design for 157 nm chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 273-284

  Ito, Hiroshi ^a   Wallraff, Greg M ^a   Brock, Phil ^a   Fender, Nicolette ^a   Truong, Hoa ^a   Breyta, Greg ^a   Miller, Dolores C ^a   Sherwood, Mark H ^a   Allen, Robert D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

157 nm resists; Chemical amplification; Copolymerization kinetics; Fluoropolymers; Hexafluoroisopropanol; trifluoromethylacrylates

Indexed keywords

COPOLYMERIZATION; DENSITY (OPTICAL); FLUORINE CONTAINING POLYMERS; REACTION KINETICS;

CHEMICALLY AMPLIFIED (CA) RESISTS;

PHOTORESISTS;

EID: 0034764894     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436857     Document Type: Article

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