Non-traditional resist designs using molecular resists: Positive tone cross-linked and non-chemically amplified molecular resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Lawson, Richard A ^a   Noga, David E ^a   Cheng, Jing ^b   Tolbert, Laren M ^b   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

acid catalyzed depolymerization; molecular resist; nitrobenzyl protecting group; non chemically amplified resists; solvent development; thermal cross linking

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; MOLECULAR RESISTS; PROTECTING GROUP; THERMAL CROSSLINKING;

ORGANIC SOLVENTS; PHOTORESISTS;

ETHERS;

EID: 77953517108     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848419     Document Type: Conference Paper

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