Everything you ever wanted to know about why the semiconductor industry needs a high refractive index photoresist...but were afraid to ask, Part 1

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Conley, Will ^a   Socha, Robert ^b  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; LITHOGRAPHY; MASKS; OPTICAL RESOLVING POWER; OPTICS; REFRACTIVE INDEX; SEMICONDUCTOR MATERIALS;

HIGHER REFRACTIVE INDEX PHOTORESIST SYSTEMS; IMMERSION FLUID; PHOTORESIST SYSTEMS; PROCESS CAPABILITY;

PHOTORESISTS;

EID: 33745595380     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659656     Document Type: Conference Paper

References (10)

1. Masuda et al. Proc. SPIE Vol. 5376, 105,
2. Zhang et al. Proc. SPIE Vol. 5376, 103
3. Zhang et al. Proc. SPIE Vol. 5376, 101
4. Hong et al. Proc. SPIE Vol. 5376, 135
5. Cesar Garza et al. Proc. SPIE Vol. 5376, 30
6. Chris Mack, Proc SPIE 5037, 1
7. Y. Ohmura, Proc SPIE 5040, 781
8. First discussed by Mircea Dusa in a private communication at National Semiconductor, Santa Clara, CA.
9. Donis Flagello et al. International SEMATECH Immersion Lithography Workshop, Los Angles, CA January 2004.
10. Blakey et al. Proc. SPIE Vol. 5753, 827 (2005)