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Volumn 396, Issue 8, 2010, Pages 2741-2755
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XPS for non-destructive depth profiling and 3D imaging of surface nanostructures
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Author keywords
3D imaging; Depth profiling; Nanostructures; XPS peak shape analysis
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Indexed keywords
3D IMAGING;
ANGLE-RESOLVED XPS;
CLUSTER ION BEAMS;
CLUSTER ION SPUTTERING;
DEPTH DISTRIBUTION;
ELECTRON PROBE;
EMISSION ANGLE;
FLAT SURFACES;
GLOW-DISCHARGE OPTICAL EMISSION SPECTROSCOPY;
MONTE CARLO CALCULATION;
NANO SCALE;
NANOSTRUCTURED SURFACE;
NON DESTRUCTIVE;
NON-DESTRUCTIVE TECHNIQUE;
ORGANIC MATERIALS;
PARALLEL FACTOR ANALYSIS;
PROBING TECHNIQUES;
SECONDARY-ION MASS SPECTROSCOPY;
SHADOWING EFFECTS;
SHAPE ANALYSIS;
SURFACE NANOSTRUCTURE;
WATER DROPLETS;
X-RAY MICROANALYSIS;
XPS;
XPS ANALYSIS;
EMISSION SPECTROSCOPY;
IMAGING SYSTEMS;
ION BEAMS;
IONS;
NANOSTRUCTURED MATERIALS;
NANOSTRUCTURES;
OPTICAL EMISSION SPECTROSCOPY;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SECONDARY ION MASS SPECTROMETRY;
SPECTRUM ANALYSIS;
SPUTTERING;
SURFACES;
THREE DIMENSIONAL;
X RAY PHOTOELECTRON SPECTROSCOPY;
DEPTH PROFILING;
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EID: 77951296652
PISSN: 16182642
EISSN: 16182650
Source Type: Journal
DOI: 10.1007/s00216-009-3401-9 Document Type: Review |
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Times cited : (41)
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References (107)
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