Intercomparison of silicon dioxide thickness measurements made by multiple techniques: The route to accuracy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1564-1571

  Seah, M P ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

INELASTIC MEAN FREE PATH (IMFP); NUCLEAR REACTION ANALYSIS (NRA); ULTRATHIN GATE OXIDES;

CONTAMINATION; GROWTH (MATERIALS); HYDROCARBONS; MATHEMATICAL MODELS; POLYPROPYLENES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR MATERIALS; THERMOOXIDATION; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICA;

EID: 4344601833     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1705594     Document Type: Conference Paper

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