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Volumn 39, Issue 4, 2007, Pages 331-336
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Study of the first nucleation steps of thin films by XPS inelastic peak shape analysis
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Author keywords
Growth mechanism; Nucleation; Physical vapour deposition (PVD); X ray photoelectron spectroscopy (XPS)
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Indexed keywords
CERIUM COMPOUNDS;
DEPOSITION;
FILM GROWTH;
NUCLEATION;
PHYSICAL VAPOR DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
VANADIUM COMPOUNDS;
X RAY PHOTOELECTRON SPECTROSCOPY;
CADMIUM SULFIDE;
CERIUM OXIDE;
VANADIUM OXIDE;
X-RAY PHOTOELECTRON SPECTRA;
THIN FILMS;
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EID: 34147196578
PISSN: 01422421
EISSN: 10969918
Source Type: Journal
DOI: 10.1002/sia.2509 Document Type: Article |
Times cited : (6)
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References (24)
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