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Volumn 33, Issue 3, 2002, Pages 238-244

Comparison of the Tougaard, ARXPS, RBS and ellipsometry methods to determine the thickness of thin SiO2 layers

Author keywords

ARXPS; Ellipsometry; RBS; SiO2 layers; Tougaard method; XPS

Indexed keywords

COMPUTER AIDED ANALYSIS; ELECTRON EMISSION; ELECTRON SCATTERING; ELLIPSOMETRY; MORPHOLOGY; MULTILAYERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SUBSTRATES; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0036500245     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1206     Document Type: Article
Times cited : (16)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.