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Volumn 445, Issue 1, 2000, Pages 71-79
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Quantitative investigation of amorphous Fe/Ge and Fe/Si by inelastic peak shape analysis
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
IRON;
SEMICONDUCTING GERMANIUM;
SEMICONDUCTING SILICON;
STOICHIOMETRY;
X RAY PHOTOELECTRON SPECTROSCOPY;
INELASTIC PEAK SHAPE ANALYSIS;
SEMICONDUCTING FILMS;
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EID: 0033903267
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(99)01041-9 Document Type: Article |
Times cited : (9)
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References (17)
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