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Thin Solid Films

Volumn 338, Issue 1-2, 1999, Pages 165-171

Nanostructure of Ge deposited on Si(001): A study by XPS peak shape analysis and AFM

(5) Simonsen, A Cohen a Schleberger, M b Tougaard, S a Hansen, J L c Larsen, A Nylandsted c

a UNIVERSITY OF SOUTHERN DENMARK (Denmark)

b UNIVERSITY OF OSNABRÜCK (Germany)

c AARHUS UNIVERSITY (Denmark)

Author keywords

Atomic force microscopy; Quantitative analysis; Surface morphology; X ray photoelectron spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; MORPHOLOGY; NANOSTRUCTURED MATERIALS; SEMICONDUCTING GERMANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

PEAK SHAPE ANALYSIS;

SEMICONDUCTING SILICON;

EID: 0032715402 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01079-7 Document Type: Article

Times cited : (22)

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