Determination of overlayer thickness by QUASES analysis of photon-excited KLL Auger spectra of Ni and Cu films

Surface and Interface Analysis

Volumn 31, Issue 4, 2001, Pages 271-279

  Kover L ^a   Tougaard, S ^b   Toth J ^a   Daroczi L ^c   Szabo I ^c   Langer, G ^c   Menyhard M ^d  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^b UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

^c UNIVERSITY OF DEBRECEN   (Hungary)

^d RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

KLL Auger spectra; Ni and Cu thin films; Thickness determination; X ray excited AES

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPUTER SOFTWARE; COPPER; DEPOSITION; ELECTRON SCATTERING; NICKEL; PHOTONS; QUARTZ; SPECTROSCOPIC ANALYSIS; SUBSTRATES; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

SCANNING PROBE MICROSCOPY (SPM);

METALLIC FILMS;

EID: 0035305243     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.988     Document Type: Article

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