Evaluation of validity of the depth-dependent correction formula (CF) for elastic electron scattering effects in AES and XPS

Surface and Interface Analysis

Volumn 26, Issue 5, 1998, Pages 374-384

  Jablonski, A ^a   Tougaard, S ^b  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

^b UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

Author keywords

Elastic scattering; Peak attenuation; Quantitative surface analysis

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRON SCATTERING; MONTE CARLO METHODS; SURFACE TESTING;

ELASTIC ELECTRON SCATTERING; SURFACE ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0032072685     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(19980501)26:5<374::AID-SIA382>3.0.CO;2-U     Document Type: Review

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