Monitoring interface interactions by XPS at nanometric tin oxides supported on Al2O3 and Sb2Ox

Journal of Physical Chemistry B

Volumn 108, Issue 28, 2004, Pages 9905-9913

  Reiche, Rainer ^a   Oswald, Steffen ^a   Yubero, Francisco ^b   Espinós, Juan P ^b   Holgado, Juan P ^b   González Elipe, Agustin R ^b  

^a IFW DRESDEN   (Germany)

^b INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CHEMICAL BONDS; CURRENT DENSITY; DEPOSITION; INTERFACES (MATERIALS); ION BOMBARDMENT; KINETIC ENERGY; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; OXIDATION; PERMITTIVITY; POLARIZATION; REFRACTIVE INDEX; SINGLE CRYSTALS; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRONIC PARAMETERS; PLASMA OXIDATION; POLARIZABILITIES; RELAXATION ENERGY;

TIN COMPOUNDS;

EID: 3543124149     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp031274m     Document Type: Article

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