Probing the ex situ morphology of Ge islands on Si(001): AFM and XPS inelastic peak shape analysis

Surface and Interface Analysis

Volumn 31, Issue 4, 2001, Pages 328-337

  Simonsen, A Cohen ^a   Tougaard, S ^a   Hansen, J L ^b   Larsen, A Nylandsted ^b  

^a UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

^b AARHUS UNIVERSITY   (Denmark)

Author keywords

AFM; Germanium; Nanostructure structure; Silicon; Surface morphology; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; GERMANIUM; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OXIDATION; SEMICONDUCTING SILICON; SUBSTRATES; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

PEAK SHAPE ANALYSIS;

CRYSTAL GROWTH;

EID: 0035306054     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.981     Document Type: Article

References (44)

1. Kasper E. Appl. Surf. Sci. 1996; 102: 189.
2. Abstreiter G, Schittenhelm P, Engel C, Silveira E, Zrenner A, Meertens D, Jäger W. Semicond. Sci. Technol. 1996; 11: 1521.
3. Sunamura H, Usami N, Shiraki Y, Fukatsu S. Appl. Phys. Lett. 1995; 66: 3024.
4. Tougaard S. J. Vac. Sci. Technol. 1996; A14: 1415.
5. Tougaard S. Surf. Interface Anal. 1998; 26: 249.
6. Schleberger M, Fujita D, Scharfschwerdt C, Tougaard S. J. Vac. Sci. Technol. 1995; B13: 949.
7. Schleberger M, Fujita D, Scharfschwerdt C, Tougaard S. Surf. Sci. 1995; 331-333: 942.
8. Schleberger M, Simonsen AC, Tougaard S, Hansen JL, Larsen AN. J. Vac. Sci. Technol. A 1997; 15: 3032.
9. Simonsen AC, Schleberger M, Tougaard S, Hansen JL, Larsen AN. Thin Solid Films 1999; 338: 165.
10. Kamins TI, Carr EC, Williams RS, Rosner SJ. J. Appl. Phys. 1997; 81: 211.
11. Medeiros-Ribeiro G, Kamins TI, Ohlberg DAA, Williams RS. Phys. Rev. B 1998; 58: 3533.
12. Kamins TI, Medeiros-Ribeiro G, Ohlberg DAA, Williams RS. J. Appl. Phys. 1999; 85: 1159.
13. Kamins TI, Medeiros-Ribeiro G, Ohlberg DAA, Williams RS. Appl. Phys. A 1998; 67: 727.
14. Williams RS, Medeiros-Ribeiro G, Kamins TI, Ohlberg DAA. J. Phys. Chem. B 1998; 102: 9605.
15. Kamins TI, Ohlberg DAA, Williams RS, Zhang W, Chou SY. Appl. Phys. Lett. 1999; 74: 1773.
16. Williams RS, Medeiros-Ribeiro G, Kamins TI, Ohlberg DAA. Acc. Chem. Res. 1999; 32: 425.
17. Medeiros-Ribeiro G, Bratkovski AM, Kamins TI, Ohlberg DAA, Williams RS. Science 1998; 279: 353.
18. Mo Y-W, Savage DE, Schwarzentruber BS, Lagally MG. Phys. Rev. Lett. 1990; 65: 1020.
19. Vesterlund Pedersen E, Jensen F, Shiryaev SYu, Petersen JW, Hansen JL, Larsen AN. Thin Solid Films 1998; 321: 92.
20. Goryll M, Vescan L, Schmidt K, Mesters S, Lüth H, Szot K. Phys. Rev. B 1997; 56: 10459.
21. Floro JA, Chason E, Twesten RD, Hwang RQ, Freund LB. Phys. Rev. Lett. 1997; 79: 3946.
22. Floro JA, Lucadamo GA, Chason E, Freund LB, Sinclair M, Twesten RD, Hwang RQ. Phys. Rev. Lett. 1998; 80: 4717.
23. Floro JA, Chason E, Freund LB, Twesten RD, Hwang RQ, Lucadamo GA. Phys. Rev. B 1999; 59: 1990.
24. Vinh Le Thanh, Boucaud P, Débarre D, Zheng Y, Bouchier D, Lourtioz J-M. Phys. Rev. B 1998; 58: 13115.
25. Le Thanh V, Boucaud P, Zheng Y, Younsi A, Débarre D, Bouchier D, Lourtioz J-M. J. Cryst. Growth 1999; 201/202: 1212.
26. Capellini G, Di Gaspare L, Evangelisti F, Palange E. Appl. Phys. Lett. 1997; 70: 493.
27. Palange E, Ragni L, Di Gaspare L, Capellini G, Evangelisti F. J. Appl. Phys. 1998; 83: 5840.
28. Ross FM, Tersoff J, Tromp RM. Phys. Rev. Lett. 1998; 80: 984.
29. Ross FM, Tersoff J, Tromp RM. Microsc. Microanal. 1998; 4: 254.
30. Shchukin VA, Bimberg D. Appl. Phys. A 1998; 67: 687.
31. Shchukin VA, Ledentsov NN, Kop'ev PS, Bimberg D. Phys. Rev. Lett. 1995; 75: 2968.
32. Chaparro SA, Zhang Y, Drucker J, Chandrasekhar D, Smith DJ. J. Appl. Phys. 2000; 87: 2245.
33. Chaparro SA, Drucker J, Zhang Y, Chandrasekhar D, McCartney MR, Smith DJ. Phys. Rev. Lett. 1999; 83: 1199.
34. Seah MP. Surf. Interface. Anal. 1993; 20: 243.
35. Tanuma S, Powell CJ, Penn DR. Surf. Interface Anal. 1988; 11: 577.
36. Simonsen AC, Pøhler JP, Jeynes C, Tougaard S. Surf. Interface Anal. 1999; 27: 52.
37. Tougaard S. Surf. Interface. Anal. 1997; 25: 137.
38. Avouris Ph, Lyo IW. Appl Surf. Sci. 1992; 60/61: 426.
39. Grütter P, Zimmermann-Edling W, Brodbeck D. Appl. Phys, Lett. 1992; 60: 2741.
40. Sheiko SS, Möller M, Reuvekamp EMCM, Zandbergen HV. Phys. Rev. B 1993; 48: 5675.
41. Mo Y-W, Lagally MG. J. Crystal Growth 1991; 111: 876.
42. Wöhl G, Schöllhorn C, Brunner K, Eberl K, Kienzle O, Ernst F. Thin Solid Films 1998; 321: 86.
43. Sakamoto K, Matsuhata H, Tanner MO, Wang D, Wang KL. Thin Solid Films 1998; 321: 55.
44. Knall J, Pethica JB. Surf. Sci. 1992; 265: 156.