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Surface Science

Volumn 498, Issue 1-2, 2002, Pages 11-20

Surface morphology of SiO2 on a Si(111) 7×7 surface formed after alternating exposure to caesium and oxygen and subsequent annealing

(5) Semak, B S a Jensen, T b Takker, L B b Morgen, P a Tougaard, S a

a UNIVERSITY OF SOUTHERN DENMARK (Denmark)

b NanoS (Denmark)

Author keywords

Oxidation; Silicon oxides; Surface structure, morphology, roughness, and topography; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; CESIUM; MORPHOLOGY; OXIDATION; OXYGEN; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE FORMATION;

SILICA;

EID: 0036467569 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01728-9 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.