Determination of growth mechanisms by X-ray photoemission and ion scattering spectroscopies: application to thin iron oxide films deposited on SiO2

Surface Science

Volumn 457, Issue 1, 2000, Pages 24-36

  Yubero, F ^a   Gonzalez Elipe A R ^a   Tougaard, S ^b  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

IRON OXIDES; MORPHOLOGY; POISSON DISTRIBUTION; POLYCRYSTALLINE MATERIALS; SILICA; SURFACES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION SCATTERING SPECTROSCOPY; TOUGAARD METHOD;

FILM GROWTH;

EID: 0343442381     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00370-8     Document Type: Article

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