Material and process limits in silicon VLSI technology

Proceedings of the IEEE

Volumn 89, Issue 3, 2001, Pages 240-258

  Plummer, James D ^a   Griffin, Peter B ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

Dielectric materials; Mosfets; Semiconductor device doping; Semiconductor device fabrication; Silicon

Indexed keywords

EID: 0000438376     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/5.915373     Document Type: Article

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