SCOPUS 정보 검색 플랫폼

MRS Bulletin

Volumn 36, Issue 11, 2011, Pages 877-884

Novel materials by atomic layer deposition and molecular layer deposition

(3) Leskelä, Markku a Ritala, Mikko a Nilsen, Ola b

a UNIVERSITY OF HELSINKI (Finland)

b UNIVERSITY OF OSLO (Norway)

Author keywords

Atomic layer deposition; dielectric; metallic conductor; microelectronics; thin film

Indexed keywords

ATOMS; DIELECTRIC MATERIALS; FLUORINE COMPOUNDS; HYBRID MATERIALS; LITHIUM COMPOUNDS; MATERIALS PROPERTIES; MICROELECTRONICS; SELF ASSEMBLY; SURFACE REACTIONS; THIN FILMS;

DEPOSITED LAYER; INORGANIC-ORGANIC HYBRID MATERIALS; LI-CONTAINING COMPOUNDS; METALLIC CONDUCTOR; MOLECULAR LAYER DEPOSITION; NEW APPLICATIONS; NOVEL MATERIALS; VOLATILE PRECURSORS;

ATOMIC LAYER DEPOSITION;

EID: 82055169259 PISSN: 08837694 EISSN: None Source Type: Journal
DOI: 10.1557/mrs.2011.240 Document Type: Article

Times cited : (41)

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