Growth of high-dielectric-constant TiO2 films in capacitors with RuO2 electrodes

Electrochemical and Solid-State Letters

Volumn 11, Issue 6, 2008, Pages

  Frohlich K ^a,c   Tapajna M ^a   Rosova A ^a   Dobrocka E ^a   Husekova K ^a   Aarik, J ^b   Aidla, A ^b  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^b UNIVERSITY OF TARTU   (Estonia)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; PERMITTIVITY; TEMPERATURE MEASUREMENT; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CAPACITANCE-VOLTAGE MEASUREMENTS; EQUIVALENT OXIDE THICKNESS (EOT);

TITANIUM DIOXIDE;

EID: 42349100301     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2898184     Document Type: Article

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