Atomic layer deposition of ferroelectric bismuth titanate Bi 4Ti3O12 thin films

Chemistry of Materials

Volumn 18, Issue 16, 2006, Pages 3883-3888

  Vehkamäki, Marko ^a   Hatanpää, Timo ^a   Kemell, Marianna ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH COMPOUNDS; DEPOSITION; FERROELECTRIC MATERIALS; FILM GROWTH; MORPHOLOGY; PEROVSKITE;

ATOMIC LAYER DEPOSITION; DEPOSITION TEMPERATURE; PYROCHLORE; TITANIUM METHOXIDE;

AMORPHOUS FILMS;

EID: 33748282387     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm060966v     Document Type: Article

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