Sacrificial layers for air gaps in NEMS using alucone molecular layer deposition

Sensors and Actuators, A: Physical

Volumn 155, Issue 1, 2009, Pages 8-15

  Seghete, D ^a   Davidson, B D ^b   Hall, R A ^a   Chang, Y J ^b   Bright, V M ^b   George, S M ^a  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

Author keywords

Air gap; Atomic layer deposition; Molecular layer deposition; NEMS; Sacrificial layer

Indexed keywords

ACIDIC SOLUTIONS; AIR GAP; AIR-GAPS; ALUMINUM CONTENTS; ATOMIC LAYER; CONFORMALITY; ELECTROMECHANICAL SYSTEMS; HYDROCHLORIC ACID SOLUTION; LINEAR GROWTH; LOW DENSITY; MEMS/NEMS; MOLECULAR LAYER DEPOSITION; NEW MATERIAL; ORGANIC-INORGANIC; OXYGEN PLASMAS; SACRIFICIAL LAYER;

ATOMIC LAYER DEPOSITION; ATOMS; HYBRID MATERIALS; HYDROCHLORIC ACID; OXYGEN; SELF ASSEMBLY; TEMPERATURE CONTROL;

DEPOSITION;

EID: 71749114437     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2008.12.016     Document Type: Article

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