Bismuth precursors for atomic layer deposition of bismuth-containing oxide films

Journal of Materials Chemistry

Volumn 14, Issue 21, 2004, Pages 3191-3197

  Vehkamäki, Marko ^a   Hatanpää, Timo ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; FILM GROWTH; METALLIC FILMS; SURFACE REACTIONS; SYNTHESIS (CHEMICAL);

ATOMIC LAYER DEPOSITION (ALD); POST DEPOSITION ANNEALING; PRECURSORS;

BISMUTH;

AMIDE; BISMUTH; OXIDE; PEROVSKITE; THIOAMIDE;

CHEMICAL ANALYSIS; CONFERENCE PAPER; CRYSTAL STRUCTURE; FILM; HEATING; SYNTHESIS;

EID: 9144219795     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b405891g     Document Type: Conference Paper

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