Atomic Layer Deposition of Strontium Tantalate Thin Films from Bimetallic Precursors and Water

Journal of the Electrochemical Society

Volumn 151, Issue 4, 2004, Pages

  Vehkamäki, Marko ^a   Ritala, Mikko ^a   Leskelä, Markku ^a   Jones, Anthony C ^b,c   Davies, Hywel O ^c   Sajavaara, Timo ^a   Rauhala, Eero ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

^c Epichem Oxides Division   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BIMETALS; COMPOSITION; CRYSTALLIZATION; DEPOSITION; DIELECTRIC PROPERTIES; FERROELECTRIC MATERIALS; IMPURITIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; POLARIZATION; REACTION KINETICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY; STRONTIUM COMPOUNDS; SURFACE REACTIONS;

ATOMIC LAYER DEPOSITION (ALD); BIMETALLIC PRECURSORS; TIME-OF-FLIGHT ELASTIC RECOIL DETECTION;

THIN FILMS;

EID: 11144357153     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1648025     Document Type: Article

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