Molecular layer deposition of functional thin films for advanced lithographic patterning

ACS Applied Materials and Interfaces

Volumn 3, Issue 2, 2011, Pages 505-511

  Zhou, Han ^a   Bent, Stacey F ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

Acid labile group; Molecular layer deposition (MLD); Organic film; Photoresist; Polyurea

Indexed keywords

ACID TREATMENTS; ACID-LABILE; DIISOCYANATES; ELECTRONIC DEVICE; ETHYLENE DIAMINE; FUNCTIONAL MOIETIES; LAYER-BY-LAYERS; LINEAR GROWTH RATE; LITHOGRAPHIC PATTERNING; MOLECULAR LAYER DEPOSITION; ORGANIC FILMS; PHOTOACID GENERATORS; PHOTORESIST MATERIALS; POLYUREA FILM; POLYUREAS; RESIST FILMS; STOICHIOMETRIC COMPOSITIONS; UREA COUPLING REACTIONS; UV-PATTERNING;

DEPOSITION; FILM GROWTH; PHOTORESISTORS; PHOTORESISTS; PROPANE; SELF ASSEMBLY; UREA;

FILMS;

EID: 84862833682     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am1010805     Document Type: Article

References (32)

1. International Technology Roadmap for Semiconductors: 2009 Lithography Update. http://www.itrs.net/links/2009Winter/Presentations/ Conference/Litho- 121609.pdf
2. Wagner, C.; Harned, N. Nat. Photonics 2010, 4, 24.
3. Van Steenwinckel, D.; Lammers, J. H.; Leunissen, L. H.; Kwinten, J. A. J. M. Proc. SPIE 2005, 5753, 269.
4. Covert, K. L.; Russell, D. J. J. Appl. Polym. Sci. 1993, 49, 657.
5. Fedynyshyn, T. H.; Astolfi, D. K.; Cabral, A.; Roberts, J. Proc. SPIE 2007, 6519, 65190X.
6. Jouve, A.; Simon, J.; Foucher, J.; David, T.; Tortai, J.-H.; Solak, H. Proc. SPIE 2005, 5753, 720.
7. Walsh, C. B.; Franses, E. I. Thin Solid Films 2003, 429, 71.
8. Kuan, S. W. J.; Frank, C. W.; Lee, Y. H. Y.; Eimori, T.; Allee, D. R.; Pease, R. F. W.; Browning, R. J. Vac. Sci. Technol., B 1989, 7, 1745.
9. Ritala, M.; Leskela, M. In Handbook of Thin Film Materials, Nalwa, H. S., Ed.; Academic Press: San Diego, CA, 2002; Vol. 1.
10. George, S. M.; Yoon, B.; Dameron, A. A. Acc. Chem. Res. 2009, 42, 498.
11. Kubono, A.; Yuasa, N.; Shao, H. L.; Umemoto, S.; Okui, N. Thin Solid Films 1996, 289, 107.
12. Shao, H. I.; Umemoto, S.; Kikutani, T.; Okui, N. Polymer 1997, 38, 459.
13. Du, Y.; George, S. M. J. Phys. Chem. C 2007, 111, 8509.
14. Adarnczyk, N. M.; Dameron, A. A.; George, S. M. Langmuir 2008, 24, 2081.
15. Bitzer, T.; Richardson, N. V. Appl. Phys. Lett. 1997, 71, 1890.
16. Yoshimura, T.; Tatsuura, S.; Sotoyama, W. Appl. Phys. Lett. 1991, 59, 482.
17. Bitzer, T.; Richardson, N. V. Appl. Surf. Sci. 1999, 144-45, 339.
18. Usui, H. Thin Solid Films 2000, 365, 22.
19. Kim, A.; Filler, M. A.; Kim, S.; Bent, S. F. J. Am. Chem. Soc. 2005, 127, 6123.
20. Loscutoff, P. W.; Zhou, H.; Clendenning, S. B.; Bent, S. F. ACS Nano 2010, 4, 331.
21. Kutchoukow, V. G.; Mollinger,J. R.; Bossche, A. In Proceedings of 13th European Conference on Solid-State Transducers (Eurosensors XIII); Lausanne, Switzerland, Sept 6-9, 1999; EPFL: Lausanne, Switzerland, 1999, pp 256.
22. Pham, N. P.; Sarro, P. M.; Burghartz, J. N. Proc. SPIE 2000, 4174, 390.
23. Sato, M.; IIjima, M.; Takahashi, Y. J. Photopolym. Sci. Technol. 1995, 8, 137.
24. Paramonov, S. E.; Bachelder, E. M.; Beaudette, T. T.; Standley, S. M.; Lee, C. C.; Dashe, J.; Frechet, J. M. J. Bioconjugate Chem. 2008, 19, 911.
25. Zheng, W. W.; Frank, C. W. Langmuir 2010, 26, 3929.
26. Jensen, S.; Früchtl, H.; Baddeley, C. J. J. Am. Chem. Soc. 2009, 131, 16706.
27. Vandenberg, E. T.; Bertilsson, L.; Liedberg, B.; Uvdal, K.; Erlandsson, R.; Elwing, H.; Lundstrom, I. J. Colloid Interface Sci. 1991, 147, 103.
28. Haller, I. J. Am. Chem. Soc. 1978, 100, 8050.
29. Howarter, J. A.; Youngblood, J. P. Langmuir 2006, 22, 11142.
30. Vien, D. L.; Colthup, N. B.; Fateley, W. G.; Grasselli, J. G. The Handbook of Infrared and Raman Characteristic Frequencies of Organic Molecules; Academic Press: London, 1991.
31. Beamson, G.; Briggs, D. High-Resolution XPS of Organic Polymers: The Scienta ESCA300 Database; Wiley: Chichester, U.K., 1992.
32. Kim, J. H.; Kim, Y. H.; Chon, S. M.; Nagai, T.; Noda, M.; Yamaguchi, Y.; Makita, Y.; Nemoto, H. J. Photopolym. Sci. Technol. 2004, 17, 379.