Growth and phase stabilization of HfO2 thin films by ALD using novel precursors

Journal of Crystal Growth

Volumn 312, Issue 2, 2010, Pages 245-249

  Niinistö, Jaakko ^a   Mäntymäki, Miia ^a   Kukli, Kaupo ^a,b   Costelle, Leila ^a   Puukilainen, Esa ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b UNIVERSITY OF TARTU   (Estonia)

Author keywords

A3. Atomic layer deposition; A3. Chemical vapor deposition processes; B1. Oxides; B2. Dielectric materials

Indexed keywords

A3. CHEMICAL VAPOR DEPOSITION PROCESSES; B1. OXIDES; B2. DIELECTRIC MATERIALS; CAPACITANCE-EQUIVALENT THICKNESS; CARBON AND HYDROGENS; CHEMICAL VAPOR DEPOSITION PROCESS; CYCLOPENTADIENYLS; GROWTH MECHANISMS; GROWTH MODES; IMPURITY CONTENT; NOVEL PRECURSORS; OXYGEN SOURCES; PHASE STABILIZATION; TETRAGONAL PHASIS; THERMAL DECOMPOSITIONS; THERMAL STABILITY;

ATOMIC LAYER DEPOSITION; ATOMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; HAFNIUM; HAFNIUM COMPOUNDS; OZONE; PYROLYSIS; REACTION KINETICS; THICK FILMS; THIN FILMS; TITANIUM NITRIDE; YTTRIUM;

DIELECTRIC MATERIALS;

EID: 71649086924     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.10.028     Document Type: Article

References (27)

1. Bohr M.T., Chan R.S., Ghani T., and Mistry K. IEEE Spectrum 44 10 (2007) 29
2. Vanderbilt D., Zhao X., and Ceresoli D. Thin Solid Films 486 (2005) 125
3. Fischer D., and Kersch A. Appl. Phys. Lett. 92 (2008) 012908
4. Ritala M., and Niinistö J. In: Jones A.C., and Hitchman M.L. (Eds). Chemical Vapour Deposition: Precursors and Processes (2009), Royal Society of Chemistry 158-206
5. Jones A.C., Aspinall H.C., Chalker P.R., Potter R.J., Manning T.D., Lo Y.F., O'Kane R., Gaskell J.M., Smith L.M., and Vap Chem. Deposition 12 (2006) 83
6. Aarik J., Aidla A., Mändar H., Sammelselg V., and Uustare T. J. Cryst. Growth 220 (2000) 105
7. K. Kukli, M. Ritala, M. Leskelä, in: S. Duenas, H. Castan (Eds.), New Materials and Processes for Incoming Semiconductors Technologies, Transworld Research Network, 2006, pp. 1-40.
8. Hausmann D.M., Kim E., Becker J., and Gordon R.G. Chem. Mater. 14 (2002) 4350
9. Kukli K., Ritala M., Leskelä M., Sajavaara T., and Keinonen J. Chem. Vap. Deposition 8 (2002) 199
10. Granneman E., Fischer P., Pierreux D., Terhorst H., and Zagwijn P. Surf. Coat. Technol. 201 (2007) 8899
11. Senzaki Y., Park S., Chatham H., Bartholomew L., and Nieveen W. J. Vac. Sci. Technol. A 22 (2004) 1175
12. Niinistö J., Putkonen M., Niinistö L., Stoll S.L., Kukli K., Sajavaara T., Ritala M., and Leskelä M. J. Mater. Chem. 15 (2005) 2271
13. Niinistö J., Putkonen M., Niinistö L., Song F., Williams P., Heys P.N., and Odedra R. Chem. Mater. 19 (2007) 3319
14. Niinistö J., Kukli K., Kariniemi M., Ritala M., Leskelä M., Blasco N., Pinchart A., Lachaud C., Laaroussi N., Wang Z., and Dussarrat C. J. Mater. Chem. 18 (2008) 5243
15. Suntola T. Thin Solid Films 216 (1992) 84
16. Niinistö J., Putkonen M., and Niinistö L. Chem. Mater. 16 (2004) 2953
17. Ylilammi M., and Ranta-aho T. Thin Solid Films 232 (1993) 56
18. M. Putkonen, T. Sajavaara, L. Niinistö, J. Keinonen, Anal. Bioanal. Chem. 382 (2005) 1791.
19. Assmann W., Davies J.A., Dollinger G., Forster J.S., Huber H., Reichelt T., and Siegele R. Nucl. Instrum. Methods Phys. Res. Sect. B 118 (1996) 242
20. Niinistö J., Putkonen M., Niinistö L., Arstila K., Sajavaara T., Lu J., Kukli K., Ritala M., and Leskelä M. J. Electrochem. Soc. 153 (2006) F39
21. Triyoso D.H., Hegde R.I., White Jr. B.E., and Tobin P.J. J. Appl. Phys. 97 (2005) 124107
22. Kukli K., Aarik J., Ritala M., Uustare T., Sajavaara T., Lu J., Sundqvist J., Aidla A., Pung L., and Hårsta A. J. Appl. Phys. 96 (2004) 5298
23. Park J., Cho M., Kim S.K., Park T.J., Lee S.W., Hong S.H., and Hwang C.S. Appl. Phys. Lett. 86 (2005) 112907
24. Niinistö J., Kukli K., Sajavaara T., Ritala M., Leskelä M., Oberbeck L., Sundqvist J., and Schröder U. Electrochem. Solid-State Lett. 12 (2009) G1
25. Kukli K., Ritala M., Lu J., Hårsta A., and Leskelä M. J. Electrochem. Soc. 151 (2004) F189
26. Kukli K., Ritala M., Sajavaara T., Keinonen J., and Leskelä M. Thin Solid Films 416 (2002) 72
27. Kukli K., Ihanus J., Ritala M., and Leskelä M. Appl. Phys. Lett. 68 (1996) 3737