SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics

Volumn 48, Issue 12, 2009, Pages

Evaluation of chemical gradient enhancement methods for chemically amplified extreme ultraviolet resists

(4) Kozawa, Takahiro a Oizumi, Hiroaki a,b Itani, Toshiro a,b Tagawa, Seiichi a

a OSAKA UNIVERSITY (Japan)

b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACID GENERATORS; CHEMICAL GRADIENTS; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; LATENT IMAGES; LINE EDGE ROUGHNESS; POLYMER ABSORPTION; TRADE-OFF RELATIONSHIP;

ABSORPTION; PHOTORESISTS; ULTRAVIOLET DEVICES;

ROUGHNESS MEASUREMENT;

EID: 75149153272 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.126004 Document Type: Article

Times cited : (24)

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