Line-edge roughness in sub-0.18-μm resist patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 634-642

  Palmateer, Susan C ^a   Cann, Susan G ^a   Curtin, Jane E ^a   Doran, Scott P ^a   Eriksen, Lynn M ^a   Forte, Anthony R ^a   Kunz, Roderick R ^a   Lyszczarz, Theodore M ^a   Stern, Margaret B ^a   Nelson Thomas, Carla M ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS; PLASMA ETCHING; SILANES;

BI LAYERS; ETCH MASKS; LINE-EDGE ROUGHNESS; PATTERNED FEATURES; PLANARIZING; PLASMA ETCH; PLASMA-INDUCED; RESIST PATTERNS; SIDE WALL ROUGHNESS; SILICON CONTENTS; SILYLATION; SINGLE LAYERS; SURFACE IMAGING; TOP SURFACE IMAGING; TRI-LAYER RESISTS; TRILAYER;

PLASMAS;

EID: 33745617811     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312395     Document Type: Conference Paper

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