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Volumn 20, Issue 4, 2007, Pages 577-583

Sensitization distance and acid generation efficiency in a model system of chemically amplified electron beam resist with methacrylate backbone polymer

Author keywords

Anion distribution; Chemically amplified resist; Line edge roughness; Polymethylmethacrylate; Sensitization distance

Indexed keywords


EID: 35948956844     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.577     Document Type: Article
Times cited : (61)

References (55)
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    • ed. D. R. Lide Taylor & Francis, Florida
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.