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Volumn 22, Issue 6, 2004, Pages 2966-2968
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Effects of flare in extreme ultraviolet lithography: Learning from the engineering test stand
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Author keywords
[No Author keywords available]
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Indexed keywords
CRITICAL DIMENSIONS (CD);
ENGINEERING TEST STAND (ETS);
EXTREME ULTRAVIOLET (EUV);
FLARE VARIATION COMPENSATION;
COMPUTER SIMULATION;
DEGRADATION;
DIFFRACTION;
DOSIMETRY;
LIGHT SCATTERING;
MATHEMATICAL MODELS;
MIRRORS;
OPTICAL SYSTEMS;
SCANNING ELECTRON MICROSCOPY;
SILICON WAFERS;
SIMULATORS;
SURFACE ROUGHNESS;
TRANSFER FUNCTIONS;
ULTRAVIOLET RADIATION;
LITHOGRAPHY;
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EID: 13244299674
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1824068 Document Type: Conference Paper |
Times cited : (34)
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References (14)
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