Design of faster high resolution resists: Getting more acid yield from EUV photons

Journal of Photopolymer Science and Technology

Volumn 21, Issue 3, 2008, Pages 415-420

  Thackeray, James W ^a   Aqad, Emad ^a   Cronin, Michael F ^a   Spear Alfonso, Kathleen ^a  

^a ROHM AND HAAS COMPANY   (United States)

Author keywords

Acid diffusion; EUV lithography; Outgassing; Photospeed; Resolution

Indexed keywords

EID: 50149104365     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.415     Document Type: Article

References (14)

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