Theoretical calculation of photoabsorption of various polymers in an extreme ultraviolet region

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 12 B, 1999, Pages 7109-7113

  Matsuzawa, Nobuyuki N ^a,c   Oizumi, Hiroaki ^a,d   Mori, Shigeyasu ^a,e   Irie, Shigeo ^a,f   Shirayone, Shigeru ^a,d   Yano, Ei ^a,g   Okazaki, Shinji ^a,d   Ishitani, Akihiko ^a,h   Dixon, David A ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^c SONY CORPORATION   (Japan)

^d HITACHI LTD   (Japan)

^e SHARP CORPORATION   (Japan)

^f PANASONIC CORPORATION   (Japan)

^g FUJITSU LABORATORIES LTD   (Japan)

^h NEC CORPORATION   (Japan)

Author keywords

13nm; Density; EUV lithography; Linear absorption coefficient

Indexed keywords

AROMATIC POLYMERS; DENSITY (OPTICAL); LIGHT ABSORPTION; NANOTECHNOLOGY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; LINEAR ABSORPTION COEFFICIENT;

PHOTORESISTS;

EID: 0033354643     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.7109     Document Type: Article

References (18)

1. T. Watanabe and H. Kinoshita: FED J. 8 (1997) 51.
2. A. M. Hawryluck, N. M. Ceglio and D. A. Markle: Microlithogr. World Summer (1997) 17.
3. A. M. Hawryluck, N. M. Ceglio and D. A. Markle: Solid State Technol. Aug (1997) 75, and 151.
4. W. M. Mansfield, J. E. Bjorkholm, A. A. MacDowell, R. R. Freeman, L. H. Szeto, G. N. Taylor, D. M. Tennant, W. K. Waskiewicz, D. L. Windt, D. L. White, O. R. Wood II, R. M. D'Souza and A. R. Neureuther: OSA Proc. Soft-X-Ray Projection Lithogr. 12 (1991) 129.
5. G. D. Kubiak, E. M. Kneedler, R. Q. Hwang, M. T. Schulberg, K. W. Berger, J. E. Bjorkholm and W. M. Mansfield: J. Vac. Sci. Technol. B 10 (1992) 2593.
6. G. M. Wells, J. W. Taylor, F. Cerrina, D. Pearson and J. MacKay: J. Vac. Sci. Technol. B 10 (1992) 3252.
7. J. Bicerano: Predictions of the Properties of Polymers from Their Structures (Marcel Dekker, New York, 1993).
8. L. B. Kier and L. H. Hall: Molecular Connectivity in Chemistry and Drug Research (Academic Press, New York, 1976).
9. L. B. Kier and L. H. Hall: Molecular Connectivity in Structure Activity Analysis (John-Wiley & Sons, New York, 1986).
10. N. N. Matsuzawa, H. Oizumi, S. Mori, S. Irie, E. Yano, S. Okazaki and A. Ishitani: J. Photopolym. Sci. Technol. 12 (1999) 571.
11. This program is available from MSI Inc., San Diego, CA.
12. B. L. Henke, E. M. Gullikson and J. C. Davis: Atomic Data & Nucl. Data Tables 54 (1993) 181.
13. S. Takechi, A. Kotachi and I. Hanyu: Ext. Abstr. (44th Spring Meet., 1997), Chiba, 1997, Japan Society of Applied Physics and Related Societies, Tokyo, 1997, p. 568 [in Japanese].
14. S. Takechi, A. Kotachi and I. Hanyu: Dig. Abstr., Third Int. Symp. 193 nm Lithography, Onuma, 1997, Committee of Third Int. Symp. 193 nm Lithography, Tokyo, 1997, p. 38.
15. S. Iwasa, K. Maeda, K. Nakano, T. Ohfuji and E. Hasegawa: J. Photopolym. Sci. Technol. 9 (1996) 447.
16. T. Ohfuji, K. Maeda, K. Nakano and E. Hasegawa: Proc. SPIE 2774 (1996) 386.
17. R. D. Allen, R. Sooriyakumaran, J. Opitz, G. M. Wallraff, G. Breyta, R. A. Dipietro, D. C. Hofer and R. R. Kunz: J. Photopolym. Sci. Technol. 9 (1996) 465.
18. H. Gokan, S. Esho, Y. and Ohnishi: J. Electrochem. Soc. 130 (1983) 143.