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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 45-49, 2007, Pages

Theoretical study on relationship between acid generation efficiency and acid generator concentration in chemically amplified extreme ultraviolet resists

(3) Kozawa, Takahiro a Tagawa, Seiichi a Shell, Melissa b

a OSAKA UNIVERSITY (Japan)

b INTEL CORPORATION (United States)

Author keywords

Acid generation efficiency; Acid generator concentration; Depth profile; EUV lithography; Poly(4 hydroxystyrene)

Indexed keywords

CLARIFICATION; CONCENTRATION (PROCESS); LASER PULSES; LITHOGRAPHY; MONTE CARLO METHODS; PROCESS ENGINEERING; ULTRAVIOLET DEVICES;

ACID GENERATION EFFICIENCY; ACID GENERATOR CONCENTRATION; DEPTH PROFILE; EUV LITHOGRAPHY; POLY(4-HYDROXYSTYRENE);

ACIDS;

EID: 50149100302 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.L1143 Document Type: Article

Times cited : (46)

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