Acid distribution in chemically amplified extreme ultraviolet resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2481-2485

  Kozawa, Takahiro ^a   Tagawa, Seiichi ^a   Cao, Heidi B ^b   Deng, Hai ^b   Leeson, Michael J ^b  

^a OSAKA UNIVERSITY   (Japan)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID DISTRIBUTION; LINE EDGE ROUGHNESS (LER); POLYMER RADICAL CATIONS; ULTRAVIOLET RESIST;

DEPROTONATION; EXCITED STATES; EXTREME ULTRAVIOLET LITHOGRAPHY; IONIZING RADIATION; OPTIMIZATION;

PHOTORESISTS;

EID: 37149038003     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2794063     Document Type: Article

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