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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 4-7, 2007, Pages

Polymer-structure dependence of acid generation in chemically amplified extreme ultraviolet resists

(6) Yamamoto, Hiroki a Kozawa, Takahiro a Tagawa, Seiichi a Cao, Heidi B b Deng, Hai b Leeson, Michael J b

a OSAKA UNIVERSITY (Japan)

b INTEL CORPORATION (United States)

Author keywords

Acid generation; Chemically amplified resist; EUV lithography; Polystyrene

Indexed keywords

DERIVATIVES; ELECTRON BEAMS; EXTREME ULTRAVIOLET LITHOGRAPHY; POLYSTYRENES;

ACID GENERATORS; CHEMICALLY AMPLIFIED RESIST; POLYMERS LEADS;

PHOTORESISTS;

EID: 34547837992 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.L142 Document Type: Article

Times cited : (76)

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