The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 368-379

  Michaelson, Timothy B ^a   Pawloski, Adam R ^b   Acheta, Alden ^b   Nishimura, Yukio ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

Acid diffusion; Asymmetric magnification; Base diffusion; Base quencher; Chemically amplified photoresist; Contrast; Image fading; Intrinsic bias; Line edge roughness; Photolithography

Indexed keywords

ACIDS; AERIAL PHOTOGRAPHY; COMPUTER SIMULATION; CONCENTRATION (PROCESS); DIFFUSION; IMAGE PROCESSING; IMAGING TECHNIQUES; PHOTOLITHOGRAPHY; POLYMERS; QUENCHING; THIN FILMS;

ACID DIFFUSION; ASYMMETRIC MAGNIFICATION; BASE DIFFUSION; BASE QUENCHERS; CHEMICALLY AMPLIFIED RESISTS; CONTRAST; IMAGE FADING; INTRINSIC BIAS; LINE EDGE ROUGHNESS;

PHOTORESISTS;

EID: 24644509911     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599848     Document Type: Conference Paper

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