Deep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3689-3694

  Hinsberg, W ^a   Houle, F A ^a   Hoffnagle, J ^a   Sanchez, M ^a   Wallraff, G ^a   Morrison, M ^a   Frank, S ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343007082     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (24)

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3. The following references together provide a recent overview of lithographic technologies for sub-100 nm devices: J. Canning, J. Vac. Sci. Technol. B 15, 2109 (1997); J. Silverman, ibid. 15, 2117 (1997); M. McCord, ibid. 15, 2125 (1997); L. Harriott, ibid. 15, 2130 (1997); G. Gross, ibid. 15, 2136 (1997).
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